Publications

Showing results for "wolfe" 1-9 of 9

The publications on this page are generated nightly from the NCSU Library's Scholarly Publications Repository. This repository is by no means a fully comprehensive listing of publications. Publications can be added to the repository manually by visiting the Publications Repository Submission Form.

Title Journal Year
Effectiveness of student-generated video as a teaching tool for an instrumental technique in the organic chemistry laboratory Journal of Chemical Education, 93(1), 141-145. Jordan, J. T., Box, M. C., Eguren, K. E., Parker, T. A., Saraldi-Gallardo, V. M., Wolfe, M. I., & Gallardo-Williams, M. T. 2016
Thickness dependence of La0.7Sr0.3MnO3/PbZr0.2Ti0.8O3 magnetoelectric interfaces Applied Physics Letters, 107(14). Zhou, J. L., Tra, V. T., Dong, S., Trappen, R., Marcus, M. A., Jenkins, C., Frye, C., Wolfe, E., White, R., Polisetty, S., Lin, J. Y., LeBeau, J. M., Chu, Y. H., & Holcomb, M. B. 2015
Formation of nano-crystalline Si by thermal annealing of SiOx, SiCx and SiOyCx amorphous alloys: model systems for advanced device processing Journal of Non-crystalline Solids, 266(2000 May), 1009-1014. Wolfe, D. M., & Lucovsky, G. 2000
Thermochemical stability of silicon-oxygen-carbon alloy thin films: A model system for chemical and structural relaxation at SiC-SiO2 interfaces Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 17(4), 2170-2177. Wolfe, D. M., Hinds, B. J., Wang, F., Lucovsky, G., Ward, B. L., Xu, M., Nemanich, R. J., & Maher, D. M. 1999
Low-temperature (<450 degrees C), plasma-assisted deposition of poly-Si thin films on SiO2 and glass through interface engineering (vol 15, pg 1035, 1997) Wolfe, D. M., Wang, F., Habermehl, S., & Lucovsky, G. (1998). Low-temperature ( Wolfe, D. M., Wang, F., Habermehl, S., & Lucovsky, G. 1998
Study of SiOx decomposition kinetics and formation of Si nanocrystals in an SiOx matrix Journal of Non-crystalline Solids, 230 (part A)(1998 May), 507-512. Hinds, B. J., Wang, F., Wolfe, D. M., Hinkle, C. L., & Lucovsky, G. 1998
Investigation of postoxidation thermal treatments of Si/SiO2 interface in relationship to the kinetics of amorphous Si suboxide decomposition Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 16(4), 2171-2176. Hinds, B. J., Wang, F., Wolfe, D. M., Hinkle, C. L., & Lucovsky, G. 1998
Plasma-assisted formation of low defect density SiC-SiO2 interfaces Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 15(4), 1097-1104. Golz, A., Lucovsky, G., Koh, K., Wolfe, D., Niimi, H., & Kurz, H. 1997
Low-temperature (less than 450 degrees), plasma-assisted deposition of poly-si thin films on SiO(2) and glass through interface engineering Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 15(3 pt. 1), 1035-1040. Wolfe, D. M., Wang, F., & Lucovsky, G. 1997

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