Publications

Showing results for "niu" 1-15 of 15

The publications on this page are generated nightly from the NCSU Library's Scholarly Publications Repository. This repository is by no means a fully comprehensive listing of publications. Publications can be added to the repository manually by visiting the Publications Repository Submission Form.

Title Journal Year
Structure and magnetic properties of a multi-principal element Ni-Fe-Cr-Co-Zn-Mn alloy Intermetallics, 68, 107-112. Zaddach, A. J., Niu, C., Oni, A. A., Fan, M., LeBeau, J. M., Irving, D. L., & Koch, C. C. 2016
First principles exploration of near-equiatomic NiFeCrCo high entropy alloys Journal of Alloys and Compounds, 672, 510-520. Niu, C., Zaddach, A. J., Koch, C. C., & Irving, D. L. 2016
Spin-driven ordering of Cr in the equiatomic high entropy alloy NiFeCrCo Applied Physics Letters, 106(16). Niu, C., Zaddach, A. J., Oni, A. A., Sang, X., Hurt, J. W., LeBeau, J. M., Koch, C. C., & Irving, D. L. 2015
A novel low-density, high-hardness, high-entropy alloy with close-packed single-phase nanocrystalline structures Materials Research Letters, 3(2), 95-99. Youssef, K. M., Zaddach, A. J., Niu, C. N., Irving, D. L., & Koch, C. C. 2015
Direct observation of charge mediated lattice distortions in complex oxide solid solutions Applied Physics Letters, 106(6). Sang, X. H., Grimley, E. D., Niu, C. N., Irving, D. L., & LeBeau, J. M. 2015
Mechanical properties and stacking fault energies of NiFeCrCoMn high-entropy alloy JOM: the Journal of the Minerals, Metals & Materials Society, 65(12), 1780-1789. Zaddach, A. J., Niu, C., Koch, C. C., & Irving, D. L. 2013
Effect of N-2 plasma on yttrium oxide and yttrium-oxynitride dielectrics Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films, 22(3), 445-451. Niu, D., Ashcraft, R. W., Hinkle, C., & Parsons, G. N. 2004
Chemical, physical, and electrical characterizations of oxygen plasma assisted chemical vapor deposited yttrium oxide on silicon Journal of the Electrochemical Society, 150(5), F102-F109. Niu, D., Ashcraft, R. W., Chen, Z., Stemmer, S., & Parsons, G. N. 2003
Bonding and structure of ultrathin yttrium oxide films for Si field effect transistor gate dielectric applications Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures, 21(4), 1792-1797. Ulrich, M. D., Rowe, J. E., Niu, D., & Parsons, G. N. 2003
Carbonate formation during post-deposition ambient exposure of high-k dielectrics Applied Physics Letters, 83(17), 3543-3545. Gougousi, T., Niu, D., Ashcraft, R. W., & Parsons, G. N. 2003
Elementary reaction schemes for physical and chemical vapor deposition of transition metal oxides on silicon for high-k gate dielectric applications Journal of Applied Physics, 91(9), 6173-6180. Niu, D., Ashcraft, R. W., Kelly, M. J., Chambers, J. J., Klein, T. M., & Parsons, G. N. 2002
Water absorption and interface reactivity of yttrium oxide gate dielectrics on silicon Applied Physics Letters, 80(19), 3575-3577. Niu, D., Ashcraft, R. W., & Parsons, G. N. 2002
Reactions of Y2O3 films with (001) Si substrates and with polycrystalline Si capping layers Applied Physics Letters, 81(4), 712-714. Stemmer, S., Klenov, D. O., Chen, Z. Q., Niu, D., Ashcraft, R. W., & Parsons, G. N. 2002
Electron energy-loss spectroscopy analysis of interface structure of yttrium oxide gate dielectrics on silicon Applied Physics Letters, 81(4), 676-678. Niu, D., Ashcraft, R. W., Chen, Z., Stemmer, S., & Parsons, G. N. 2002
Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2o3 thin films on Si(100) Applied Physics Letters, 75(25), 4001-4003. Klein, T. M., Niu, D., Epling, W. S., Li, W., Maher, D. M., Hobbs, C. C., Hegde, R. I., Baumvol, I. J. R., & Parsons, G. N. 1999

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