Publications

Showing results for "campbell" 1-8 of 8

The publications on this page are generated nightly from the NCSU Library's Scholarly Publications Repository. This repository is by no means a fully comprehensive listing of publications. Publications can be added to the repository manually by visiting the Publications Repository Submission Form.

Title Journal Year
Macromolecule-semiconductor interfaces: From enzyme immobilization to photoelectrocatalytical applications Journal of Electroanalytical Chemistry, 662(1), 169-183. Skorupska, K., Lewerenz, H. J., Smith, J. R., Kulesza, P. J., Mernagh, D., & Campbell, S. A. 2011
Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer Patent:
Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2006). Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer. U.S. Patent No. 7,033,642. Washington, DC: U.S. Patent and Trademark Office. Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S.
2006
Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Patent:
Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2004). Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers. U.S. Patent No. 6,767,823. Washington, DC: U.S. Patent and Trademark Office. Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S.
2004
Chemical vapor deposition method of forming a material over at least two substrates Patent:
Derraa, A., Basceri, C., Vasilyeva, I., Campbell, P. H., & Sandhu, G. S. (2004). Chemical vapor deposition method of forming a material over at least two substrates. U.S. Patent No. 6,730,355. Washington, DC: U.S. Patent and Trademark Office. Derraa, A., Basceri, C., Vasilyeva, I., Campbell, P. H., & Sandhu, G. S.
2004
Copper segregation to the Sigma 5 (310)/[001] symmetric tilt grain boundary in aluminum Interface Science, 12(03-Feb), 165-174. Campbell, G. H., Plitzko, J. M., King, W. E., Foiles, S. M., Kisielowski, C., & Duscher, G. J. M. 2004
Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers Patent:
Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S. (2003). Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers. U.S. Patent No. 6,586,285. Washington, DC: U.S. Patent and Trademark Office. Basceri, C., Vasilyeva, I., Derraa, A., Campbell, P. H., & Sandhu, G. S.
2003
Plastic deformation kinetics of fine-grained alumina Metallurgical and Materials Transactions. A, Physical Metallurgy and Materials Science, 30(11), 2809-2816. Campbell, J., Fahmy, Y., & Conrad, H. 1999
Influence of an electric field on the plastic deformation of fine-grained Al2O3 Metallurgical and Materials Transactions. A, Physical Metallurgy and Materials Science, 30(11), 2817-2823. Campbell, J., Fahmy, Y., & Conrad, H. 1999

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